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Fluorine Coatings for Nanoimprint Lithography Masks
Seidel, et al. Proceedings of SPIE 9049, 2014, VI, 90491S- Publication
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Atomic Layer Deposition of Dopants for Recoil Implantation in finFET Sidewalls
Seidel, et al. Proceedings of Ion Implantation Technology (IIT), 2014, 1- Publication
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Virtual Screening for OLED Materials
Halls, et al. Proceedings of SPIE 9183, Organic Light Emitting Materials and Devices XVIII, 2014, 91832G- Publication
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Role of Interfacial Aluminum Silicate and Silicon as Barrier Layers for Atomic Layer Deposition of Al2O3 Films on Chemically Cleaned InP (100) Surfaces
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Chemical Nature and Control of High-k Dielectric/III-V Interfaces
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Discovery of New Anode SEI Forming Additives Using an in silico Evolutionary Approach
Murdock, et al. ECS Transactions, 2015, 69(1), 67- Publication
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Ethylenediamine Grafting on Oxide-free H-, 1/3 ML F- and Cl-terminated Si(111)
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Optical Simulations for Fractional Fluorine Terminated Coatings on Nanoimprint Lithography Masks
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Atomic Layer Deposition of Boron-Containing Films using B2F4
Mane, et al. Journal of Vacuum Science & Technology, 2016, 34, 01A132- Publication
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Atomic-scale Simulation for the Analysis, Optimization and Accelerated Development of Organic Optoelectronic Materials
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Simulation of Nucleation and Growth Of ALD Phosphorus for Doping of Advanced FinFETs
Seidel, et al. Journal of Vacuum Science & Technology, 2016, 34, 01A150- Publication
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Surface Etching, Chemical Modification and Characterization of Silicon Nitride and Silicon Oxide – Selective Functionalization of Si3N4 and SiO2
Liu, et al. Journal of Physics: Condensed Matter, 2016, 28 (9), 094014
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