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Chemical Nature and Control of High-k Dielectric/III-V Interfaces
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Discovery of New Anode SEI Forming Additives Using an in silico Evolutionary Approach
Murdock, et al. ECS Transactions, 2015, 69(1), 67- Publication
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Ethylenediamine Grafting on Oxide-free H-, 1/3 ML F- and Cl-terminated Si(111)
Chopra, et al. Chemistry of Materials, 2015, 27(18), 668- Publication
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Optical Simulations for Fractional Fluorine Terminated Coatings on Nanoimprint Lithography Masks
Seidel, et al. Proceedings of SPIE 9635, Photomask Technology, 2015, 96350S- Publication
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Atomic Layer Deposition of Boron-Containing Films using B2F4
Mane, et al. Journal of Vacuum Science & Technology, 2016, 34, 01A132- Publication
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Atomic-scale Simulation for the Analysis, Optimization and Accelerated Development of Organic Optoelectronic Materials
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Simulation of Nucleation and Growth Of ALD Phosphorus for Doping of Advanced FinFETs
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Surface Etching, Chemical Modification and Characterization of Silicon Nitride and Silicon Oxide – Selective Functionalization of Si3N4 and SiO2
Liu, et al. Journal of Physics: Condensed Matter, 2016, 28 (9), 094014- Publication
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Quantum Mechanical Simulation for the Analysis, Optimization and Accelerated Development of Precursors and Processes for Atomic Layer Deposition (ALD)
Mustard, et al. Journal of the Korean Ceramic Society, 2016, 53(3), 317- Publication
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Estimation of Charge Carrier Mobility in Amorphous Organic Materials Using Percolation Corrected Random-Walk Model
Evansa, et al. Organic Electronics, 2016, 29, 50-56- Publication
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Electronic Structure of 1 to 2 nm Diameter Silicon Core/Shell Nanocrystals: Surface Chemistry, Optical Spectra, Charge Transfer and Doping
Zhou, et al. J. Am. Chem. Soc., 2003, 125, 15599-15607- Publication
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cis-{Pt(NH3)2(L)}2+/+ (L = Cl, H2O, NH3) Binding to Purines and CO: Does π-Back-Donation Play a Role?
Baik, et al. Inorg. Chem., 2003, 42, 8615-8617Case Studies
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